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STT Series Treatment of Toxic Gases in Seminconductor Factories

Overview

More than 300 industrial gases are used in the production of semiconductor factory. With the diversification of semiconductor material, the variety and quantity of gas needed are sustained growing. Most of these gases are volatile and corrosive, and they have seriously harms to the organs and tissues of the human body. Therefore, special measures should be taken to guarantee the safety of workers and to keep the environment from pollution. However, the most factories have not taken any effective measures currently. This should be given immediate attentions.

The typical examples are followed:

Arsenic alkenes (ASH3): for diffusion, Chemical gas Deposition (CVD) and extension of single crystal membrane, especially for the manufacture of compound semiconductor materials. It is a bitter and peppery matter, which poisons the nervous system, liver and kidney, and causes anemia and chronic heart disease. American government industrial hygiene Association (ACGIH) set 0.05ppm as the threshold limit ＆#118alue (TLV) for IC factory atmosphere.

Phosphorus alkenes (PH3)for deposition of silicon dioxide and growth N- type silicon and particles as an adulterant, and supplying phosphor in MOCVD (metal organic chemistry gas deposition).For instance, Al-Ga-As, Ga-In-As-P. It has acute and chronic effects to nervous system. The lungs are also seriously poisoned, and the skin, mucous membrane and kidney are disordered. American government industrial hygiene Association (ACGIH) set 0.3ppm as the threshold limit ＆#118alue (TLV).

B boron alkenes (B2H6): for deposition of single crystal silicon, as well as ion injection P-type adulterant. It has a special smell and is a strong reductant at room temperature. When it contacts with vapor in the air, it will explode into boric acid and hydrogen, even at low temperatures. It also has harms on lungs. The TLV is set to 0.1ppm by American government Industry Association (ACGIH).

Specifications:

Capacity: 10～100L/min（toxic gas: 10％diluted gas: 90％）

Principle: chemistry absorption or combustion

Effects: SiH₄＜5ppm; PH₃＜0.3ppmASH₃＜0.05ppmB₂H₆＜0.1ppm